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周玉刚

领域:高端装备制造产业 学校:南京大学职称:教授

GaN基半导体材料与器件,LED器件工艺与先进封装,光电器件及系统的可靠性分析与寿命预测
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教育背景

工作经历

项目课题经历

论文、成果、著作等

  • The Effect of the Original Thickness of Ag in the Graphene-Ag Nanodots Transparent Conductive Layer on the Electrical and Optical Properties of GaN-Based UV-LEDs, IEEE Transactions on Electron Devices, pp. 1-6, 2018.
    (Chen W, Zhou YG*, Yu XZ, Xie ZL, Zhang R, and Zheng YD)

  • Study of LED Thermal Resistance and TIM Evaluation Using LEDs With Built-in Sensor, IEEE Photonics Technology Letters, vol. 29, pp. 1856-1859, Nov 1 2017.
    (Wang XL, Zhou YG*, Tian RB, Liu B, Xie ZL, Zhang R, Zheng YD)

  • In-Situ Measurement of Junction Temperature and Light Intensity of Light Emitting Diodes With an Internal Sensor Unit,IEEE ELECTRON DEVICE LETTERS, vol. 36, pp. 1082-1084, Oct. 2015
    (Li JM, Zhou YG*, Qi YD, Miao ZL, Wang YM, Xiu XQ, Liu B, Zhang R, and Zheng YD)

  • Gate leakage in AlGaN/GaN HEMTs and its suppression by optimization of MOCVD growth, PHYSICA STATUS SOLIDI C, Vol 2, No 7, pp.2663-2667, 2005
    (Zhou YG, Chu RM, Liu J, Chen KJ, Lau KM)

  • Correlation of in-situ reflectance spectra and resistivity of GaN/Al2O3 interfacial layer in metalorganic chemical vapor deposition,JOURNAL OF ELECTRONIC MATERIALS,Vol. 34, No. 1, pp. 112-118, JAN 2005
    (Zhou YG, Wang DL, Chu WM, Tang CW, Qi YD, Lu ZD, Chen KJ, Lau KM)

  • Investigation of the polarization-induced charges in modulation-doped AlxGa1-xN/GaN heterostructures through capacitance-voltage profiling and simulation,JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, Vol. 41, No. 4B, pp. 2531-2535, APR 2002
    (Zhou YG, Shen B, Someya T, Yu HQ, Liu J, Zhou HM, Zhang R, Shi Y, Zheng YD, Arakawa Y)

  • Gas phase parasitic reactions and Al incorporation efficiency in light radiation heating, low-pressure metal-organic chemical vapor deposition of AlGaN,MATERIALS LETTERS, vol. 45, no.6, pp 331-335, Oct 2000
    (Zhou YG, Zhang R, Li WP, Shen B, Chen P, Chen ZZ, Gu SL, Shi Y, Zheng YD and Huang ZC)

  • High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment,IEEE ELECTRON DEVICE LETTERS, Vol. 26, No. 7, pp. 435-437, Jul 2005
    (Cai Y, Zhou YG, Chen KJ, Lau KM)

  • AlGaN-GaN double-channel HEMTs,IEEE TRANSACTIONS ON ELECTRON DEVICES, Vol. 52, No. 4, pp. 438-446, Apr 2005
    (Chu RM, Zhou YG, Liu J, Wang DL, Chen KJ, Lau KM)

  • 近期授权发明专利
    CN201410004973.2, 一种集成传感单元的LED器件及其制造方法, 周玉刚、张荣;
    CN201510012923.3, 一种改善电流扩展的半导体器件, 周玉刚、修向前、谢自力、陈鹏、刘斌、张荣;
    CN201510219302.2, 紫外半导体发光器件及其制造方法,周玉刚、余显正、张荣;
    CN201510308515.2, 一种集成石墨烯温度传感的LED器件及其制造方法, 周玉刚、李家明、张荣;
    CN201010190052.1, 一种使用交流电的发光器件及其制造方法, 周玉刚等;【PCT申请, 美国,欧盟,日本专利号如下WO2011147063A1 - US2011285284A1 - EP2390918A2 - JP2011249755A】


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