教育背景
南洋理工大学博士（2013年）
工作经历
四川师范大学物理与电子工程学院讲师（2005-2008年），电子科技大学能源科学与工程学院副教授（2013年）
项目课题经历
作为主研人员参加新加坡经济发展局重点支持太阳能电池项目(NRF2007EWT-CERP01-0208)及第八届中国-新加坡联合研究计划项目“薄膜硅/晶体硅异质结太阳电池关键技术联合研究”（2012-2015），主持国家自然科学基金项目及教育部重点实验室项目各一项
论文、成果、著作等
在Adv.Ener.Mater.,Sci.Repors,Appl.Phys.Letts,J.Appl.Phys等SCI学术期刊发表论文40篇 代表性期刊论文：
1. Rapid and Controllable a-Si:H-to-nc-Si:H Transition Induced by a High-density Plasma Route,H.P. Zhou, M. Xu, S. Xu, L.X. Xu, H. Ji, S. Q. Xiao, and Y. Y. Feng,J. Phys. D: Appl. Phys. 50, 385103 (2017).
2. Radicals and ions controlling by adjusting the antenna-substrate distance in a-Si:H deposition using a planar ICP for c-Si surface passivation,H.P. Zhou, S. Xu, M. Xu, L.X. Xu, D.Y. Wei, Y. Xiang and S.Q. Xiao, Applied Surface Science 396, 926 (2016).
3. Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films,H. P. Zhou, M. Xu, S. Xu, Liu, C. X. Liu, L. C. Kwek, and L. X. Xu,Scientific Reports, 6, 32716 (2016).
4. Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma,H. P. Zhou, S. Xu, M. Xu, S. Q. Xiao, Y. Xiang,J. Phys. D: Appl. Phys.48, 445302 (2015).
5. Inductively coupled hydrogen plasma processing of AZO thin films for heterojunction solar cell applications,H. P. Zhou,S. Xu, Z. Zhao, Y. Xiang,Journal of Alloy and Compounds610, 107 (2014).
6. Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications,H. P. Zhou, D. Y. Wei, L. X. Xu, Y. N. Guo, S. Q. Xiao, S. Y. Huang and S. Xu,Applied Surface Science264, 21 (2013).
7. Si surface passivation by SiOx:H films deposited by low-frequency ICP for solar cell applications,H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and M. Xu,J. Appl. Phys. D: Applied Phys. 45, 395401 (2012).
8. Phase evolution and room-temperature photoluminescence in amorphous SiC alloy,H. P. Zhou, M. Xu, D. Y. Wei, T. Ong, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and S. Xu, J. Appl. Phys.111, 103526 (2012).
9. Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma,H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, S. Khan, and M. Xu,J. Appl. Phys.112, 013708 (2012).
10. S. Xu, S.Y. Huang, I. Levchenko,H. P. Zhou, D. Y. Wei, S. Q. Xiao, L. X. Xu, W. S. Yan and K. Ostrikov, Highly efficient silicon nanoarray solar cells by a single-step plasma-based process,Advanced Energy Materials1, 373 (2011).
专利、著作版权等
英文专著章节2章,授权专利2项
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