教育背景
2000.09 – 2007.04,电子科技大学,微电子学与固体电子学,硕博连读,博士
1994.09 – 1998.06,四川大学,微电子技术,本科
工作经历
2013.06–至今, 电子科技大学,微电子与固体电子学院,副教授
2009.10 – 2010.10,香港科技大学,ECE系(Department of Electronic and Computer engineering),博士后
2007.05 – 2013.05,电子科技大学,微电子与固体电子学院,讲师
项目课题经历
论文、成果、著作等
1. Qian Luo, Di Zhao, Xiangzhan Wang, Qi Yu, Wei Cui, Kaizhou Tan, Stress Modulation Technology for 45nm-gate-CMOS Strained by a Compressive SiN Film, Nanoscience and Nanotechnology Letters (to be published)
2. Qian Luo and Qi Yu, Self-consistent Results for the 2DEG in a Quantized Triangular Well, Nanoscience and Nanotechnology Letters,Vol. 6, P 861-864, 2014
3. Zhao Di, Luo Qian, Wang Xiangzhan, Yu Qi, Cui Wei, Tan Kaizhou, Performance Enhancement of c-CESL-Strained 95nm-gate NMOSFET Using Trench-Based Structure, Journal of semiconductors (to be published)
4. Xiangzhan Wang, Qingping Zeng, Bin Liu, Cheng Gan, Qian Luo, Qi Yu, Yang Liu, Kaizhou Tan, Xianwei Ying, A Stress Concentration MOSFET Structure, IEEE Transactions on Electron Devices, 2014, 61(1), P.207
5. Ziqi Zhao, Ziyu Zhao, Qian Luo, and Jiangfeng Du, High-voltage RESURF AlGaN/GaN high electron mobility transistor with back electrode, Electronic Letters, 2013, 49(25), P.16380
6. Qian Luo, Bin Liu, Qi Yu, Xiang-zhan Wang, Jing-chun Li, Stress Management for CESL Based Strained PMOSFET Using Trench Structure, IEEE. 2012 11th International Conference on Solid-State and Integrated Circuit Technology Proceedings(ICSICT-2012), Oct. 29-Nov. 1, 2012, Xi’ an, China, P. S25_04
7. Qian Luo and Qi Yu,Electric Field Modulation by Introducing a Hk Dielectric Film of Tens of Nanometers in AlGaN/GaN HEMT,Nanoscience and Nanotechnology Letters, 2012, 4, P.1
8. Qian Luo, JiangFeng Du, XiangZhan Wang, Ning Ning, Yang Liu and Qi Yu, “An Analytical Model for Field-Plate Optimization in High Electron Mobility Transistor”, Advanced Materials Research, Optical, Electronic Materials and Applications II, Vol.529, p 33-36 (2012)
9. Xiangzhan Wang, Guixia Qin, Qian Luo,Influence of the STI Sidewall Angle on the Induced Channel Stress in Nanoscaled PMOSFETs,Journal of the Korean Physical Society , 2012, 60(10), P.1639
专利、著作版权等
1. 罗谦,刘斌,曾庆平,严慧,甘程,王向展 具有槽型结构的应变PMOSFET及其制作方法,中国, 201210551776.3
2. 罗谦,刘斌,王向展,于奇,严慧 应变沟道鳍式场效应晶体管及其制作方法,中国,201310385577.4
3. 王向展,秦桂霞,罗谦,王微,李竞春 一种MOS晶体管局部应力的引入技术,2013.2,中国,ZL201110268524.5
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