教育背景
2007年,电子科技大学,博士学位
2001年,四川大学,硕士学位
工作经历
2001年7月-至今,电子科技大学工作;
2009-2010年到英国剑桥大学进行博士后研究;
2011年聘为博士生导师,2012年破格晋升教授;
现任微电子与固体电子学系主任。
项目课题经历
论文、成果、著作等
(一)学术论文
行业顶级期刊IEEE EDL和IEEE TED共29篇
[1] Kun Zhou, Linhua Huang, Xiaorong Luo*, Zhaoji Li; Bo Zhang.Characterization and Performance Evaluation of the Superjunction RB-IGBT in Matrix Converter,IEEE Transactions on Power Electronics, DOI: 10.1109/TPEL.2017.2709323,2018.
[2] Jie Wei;Xiaorong Luo*; Linhua Huang; Bo Zhang,Simulation Study of a Novel Snapback-Free and Low Turn-Off Loss Reverse-Conducting IGBT With Controllable Trench Gate IEEE Electron Device Lett.,DOI: 10.1109/LED.2017.2780081,2018.
[3] Gaoqiang Deng, Xiao Rong Luo, Jie Wei et al.A Snapback-Free Reverse Conducting Insulated-Gate Bipolar Transistor With Discontinuous Field-Stop Layer,IEEE Transactions on Electron Devices,DOI: 10.1109/TED.2018.2817204, 2018.
[4] linhua Huang;Xiaorong Luo*; Jie Wei; Kun Zhou et al;A Snapback-Free Fast-Switching SOI LIGBT With Polysilicon Regulative Resistance and Trench Cathode,IEEE Transactions on Electron Devices,DOI: 10.1109/TED.2017.2726080,2017.
[5] Weiwei Ge, Xiaorong Luo*, Junfeng Wu,et al.Ultra-low On-Resistance LDMOS with Multi-plane Electron Accumulation Layers,IEEE Electron Device Lett., DOI: 10.1109/LED.2017.2701354,2017.
[6] Xiaorong Luo, Qiao Tan,Jie Wei,Kun Zhou,Gaoqiang Deng,Zhaoji,Ultralow On-Resistance High Voltage p-channel LDMOS with an Accumulation-Effect Extended Gate, IEEE Transactions on Electron Devices, 63(6), p.2614, 2016.
[7] Xiaorong Luo*, Da Ma, Jie Wei , et al. A split gate power FINFET with improved on-resistance and switching performance, IEEE Electron Device Lett.,37(9),p.1185, 2016.
[8] Xiaorong Luo*, Mengshan Lv, et al. Ultralow On-Resistance SOI LDMOS with Three Separated Gates and High-K Dielectric, IEEE Transactions on Electron Devices, 66(9), p.3804, 2016.
[9] Kun Zhou, Xiaorong Luo*, Linhua Huang, et al.,An Ultralow Loss Superjunction Reverse Blocking Insulated-Gate Bipolar Transistor with Shorted-Collector Trench,DOI: 10.1109/LED.2016.2613638, 2016.
[10] Jie Wei , Xiaorong Luo*, Yanhui Zhang,Pengcheng Li,Kun Zhou,Bo Zhang,Zhaoji Li, High Voltage Thin SOI LDMOS with Ultralow On-resistance and EvenTemperature Characteristic,IEEE Transactions on Electron Devices, 63(4),p.1637, 2016.
[11] Kun Zhou, Xiaorong Luo*, Qing Xu, et al. Analytical Model and New Structure of the Variable-k Dielectric Trench LDMOS with Improved, IEEE Transactions on Electron Devices, 62(10), p.3334, 2015.
[12] Xiaorong Luo, Y H Jiang, K Zhou, Bo Zhang et al. Ultra-low Specific On-Resistance Superjunction Vertical DMOS with High-K Dielectric Pillar, IEEE Electron Device Lett., 33(7) ,1042-1044, 2012.
[13] Xiaorong Luo, J Fan, Bo Zhang Florin Udrea, Ultra-low Specific On-Resistance High Voltage SOI Lateral MOSFET, IEEE Electron Device Lett., 32(2), 185-187, 2011.
[14] Xiaorong Luo, Yuangang Wang, Guoliang Yao, et al, High Voltage Partial SOI LDMOS with a Variable Low-k Dielectric Buried Layer and a Buried P-layer, IEEE Electron Device Lett., 31(6), 594-596, 2010.
[15] Xiaorong Luo, Tianfei Lei, Bo Zhang, et al. A high-voltage LDMOS compatible with high voltage integrated circuits on p-type SOI layer, IEEE Electron Device Lett.,30(10),1093-1095, 2009.
[16] Xiaorong Luo, Zhaoji Li, Bo Zhang, et al. Realization of High Voltage ( >700V) in New SOI Devices with a Compound Buried-Layer, IEEE Electron Device Lett.,29(12),pp.1395-1397, 2008.
[17] Xiaorong Luo, Bo Zhang, Zhaoji Li, et al. A Novel 700-V SOI LDMOS with Double-Sided Trench, IEEE Electron Device Lett., 28(5): 422-424, 2007.
[18] Xiaorong LuoJie Wei,Xianlong Shi,Kun Zhou,Ruichao Tian,Zhaoji Li,Bo Zhang ,Novel Reduced ON-Resistance LDMOS With an Enhanced Breakdown Voltage, IEEE Trans.on Electron Devices, 2014,61(12):4304-4308.
[19] Xiaorong Luo, J Y Cai, Y Fan,et al. Novel Low-Resistance Current path UMOS with High-K Dielectric Pillars,IEEE Trans. Electron Devices, 60(9), 2840-2846, 2013.
[20] Xiaorong Luo, T F Lei, Y. G. Wang. Low On-Resistance SOI Dual Trench- Gates MOSFET,IEEE Trans. on Electron Devices, 59(2), 504-509, 2012.
[21] Xiaorong Luo, H Deng, Y G Wang, Novel Low-k Dielectric Buried Layer High Voltage LDMOS on Partial SOI, IEEE Tran. Electron Devices, 57(2), pp.535-538, 2010.
[22] Xiaorong Luo, Bo Zhang, Tianfei Lei, Florin Udrea, et al, Numerical and Experimental Investigation on a Novel High Voltage SOI LDMOS in the self- isolation HVIC, IEEE Tran. Electron Devices, 57(11), pp. 3033-3043, 2010.
[23] Xiaorong Luo, Daping Fu, Lei Lei et al. Eliminating Back-Gate Bias Effects in a Novel SOI High-Voltage Device Structure, IEEE Tran. Electron Devices, 56(8),pp.1659-1666, 2009.
[24] Xiaorong Luo, Bo Zhang, Zhaoji Li. New high voltage (>1200V) MOSFET with the chargeTrenches on Partial SOI,IEEE Tran. Electron Devices, 2008, 55(7), 1756-1761.
[25] Kun Zhou, Xiaorong Luo*, Qing Xu, et al. A RESURF-Enhanced P-Channel SOI LDMOS with Ultralow Specific On-Resistance,IEEE Tran. Electron Devices, 61(7),2466 -2472, 2014.
[26] Wentong Zhang,Bo Zhang,Ming Qiao, Zehong Li, Xiaorong Luo,Zhaoji Li. Optimization of Lateral Superjunction Based on the Minimum Specific ON-Resistance, IEEE Tran. Electron Devices,DOI: 10.1109/TED.2016.2542263,2016.
[27] Wentong Zhang, Bo Zhang, Ming Qiao, Zehong Li, Xiaorong Luo, Zhaoji Li. Optimization and New Structure of Superjunction With Isolator Layer, IEEE Tran. Electron Devices,DOI: 10.1109/TED.2016.2628056,2017
[28]Wentong Zhang,Bo Zhang,Ming Qiao, Zehong Li, Xiaorong Luo,Zhaoji Li. The Ron.min of Balanced Symmetric Vertical Super Junction Based on R-Well model.IEEE Tran. Electron Devices, DOI: 10.1109/TED.2016.2632113, 2017.
[29] Wentong Zhang; Zhenya Zhan; Yang Yu; Shikang Cheng; Yan Gu; Sen Zhang; Xiaorong Luo, et al.
Novel Superjunction LDMOS (>950 V) With a Thin Layer SOI, IEEE Electron Device Letters, DOI: 10.1109/LED.2017.2751571,2018.
其它国内外部分重要期刊(SCI收录)
[30] Xiaorong Luo, Wei Zhang, Zhaoji Li, et al. A new structure and its analytical model for the electric field and breakdown voltage of SOI high voltage device with step thickness drift region, Semiconductor Science and technology, 2008, 23 (3):No.035028.
[31] Xiaorong Luo, Bo Zhang, Zhaoji Li. A New Structure and its Analytical Model for the Electric Field and Breakdown Voltage of SOI High Voltage Device with Variable-k Dielectric Buried Layer,Solid-State Electronics,2007,51:493-499.
[32] Xiaorong Luo, Bo Zhang, Zhaoji Li. A new SOI high voltage device with step thickness sustained voltage layer.Electronics Lett. 2008, 44 (1). 入选Electronics Letters大中华地区“精选特刊”,该特刊从大中华地区于2005-2008年期间在Electronics Letters发表的论文中精选
[33] Luo Xiao-Rong, Luo Yin-Chun, Fan Ye, et al., A low specific on-resistance SOIMOSFET with dual gates and a recessed drain, Chin. Phys. B, 22(2), 027304, 2013.
[34]Luo Xiao-Rong, Wang Qi, Yao Guo-Liang, A high voltage silicon-on-insulator lateral insulated gate bipolar transistor with a reduced cell-pitch,Chin. Phys. B, 22 (2),027303, 2013.
[35] Luo Xiao-Rong, G L Yao, Y G Wang, et al, A low on-resistance triple RESURF SOILDMOS with planar and rench gate integration,Chin. Phys. B, 21(2), 068501, 2012.
[36] Luo Xiao-Rong, Wang Yuan-Gang, Deng Hao, and Florin Udrea, A Novel Partial Silicon-On-Insulator High Voltage LDMOS with Low-k Dielectric Buried Layer, Chinese Physics B, 19(7), 077306-1-6, 2010.
[37] Luo Xiao-Rong, Yao Guo-liang, Wang Yuan-Gang, et al.Ultra-low On-Resistance High Voltage (>600) SOI MOSFET with a Reduced Cell Pitch, Chinese Physics B, 20(2):028501, 2011.
[38] Shi Xian-Long,Luo Xiao-Rong*(通信作者),Wei Jie,Tan Qiao ,A novel LDMOS with a junction field plate anda partial N-buried layer ,Chinese.Physics.B,2014,23(12).被精选为该期的High lights论文,并 在英国物理学会出版社(IOPP)网站的Featured Articles 专栏。
[39]Li Peng-Cheng, Luo Xiao-Rong*(通信作者), Luo Yin-Chun, Zhou Kun,An ultra-low specific on-resistance trench LDMOS with a U-shaped gate and accumulation layer,Chinese.Physics.B, 24(4): 047304, 2015
[40] Luo Yin-Chun,Luo Xiao-Rong*(通信作者), Hu Gang-Yi,Fan Yuan-HangA low specific on-resistance SOI LDMOS with a novel junction field plate ,Chinese.Physics.B,23(7), 2014
[41] Wang pei, Luo Xiao-Rong*(通信作者), Ultra-low specific on-resistance vertical double-diffused metal oxide semiconductor with a high-k dielectric-filled extended trench, Chin. Phys. B, 22( 2), 027305, 2013.
[42] Zhou Kun, Luo Xiao-Rong*(通信作者), Fan Yuan-Hang et al, Low on-resistance buried current path SOI P-channel LDMOS compatible with N-channel LDMOS, Chin. Phys.B,067306, 2013.
[43] Fan Yuan-Hang, Luo Xiao-Rong*(通信作者),Wang Pei, Zhou Kun et al, A High Figure-of-Merit SOI MOSFET with a Double-Sided Charge Oxide-Trench, Chin. Phys. Lett, 30(8),088503, 2013.
[44] 王骁玮,罗小蓉*(通信作者),尹超 等,高k介质电导增强SOI LDMOS机理与优化设计,物理学报,v62,n23,2013
[45] Luo Yin-Chun, Luo Xiao-Rong*(通信作者), Hu Gang-Yi, et al. A low specific on-resistance SOI LDMOS with a novel unction field plate,Chin. Phys. B Vol. 23, No. 7077306,2014.
[46] Li Peng-Cheng, Luo Xiao-Rong*(通信作者), Luo Yin-Chun, et al. An ultra-low specific on-resistance trench LDMOS with a U-shaped gate and accumulation layer,Chin.Phys. B, Vol. 24, No. 4,047304,2015.
[47] WANG Zhuo, LI Peng-Cheng, ZHANG Bo, FAN Yuan-Hang, XU Qing, Luo Xiao-Rong*(通信作者),Ultralow Specific on-Resistance Trench MOSFET with a U-Shaped Extended Gate,CHIN. PHYS. LETT. Vol.32, No. 6, 068501,2015.
[48] Wang Yuan-Gang, Luo Xiao-Rong*(通信作者), Ge Rui, Wu Li-Juan, Chen Xi,Compound buried layer SOI high voltage device with step buried oxide, Chin. Phys. B,077304, 2011.
4 篇 功率半导体领域顶级国际会议IEEE ISPSD 及邀请报告:
[49] Gaoqiang Deng;Xiaorong Luo*;Kun Zhou;Qingyuan He;Xinliang Ruan;QingLiu;Tao Sun; Bo Zhang, A snapback-free RC-IGBT with Alternating N/P buffers,IEEE ISPSD,2017,Japan.
[50] Kun Zhou; Tao Sun; Qing Liu; Bo Zhang; Zhaoji Li; Xiaorong Luo*;A snapback-free shorted-anode SOI LIGHT with multi-segmentanode, IEEE ISPSD,2017,Japan.
[51] Xiaorong Luo; Weiwei Ge; Bo Zhang, Ultralow power loss integratable high-
voltage MOSFETs, 2017 IEEE 12th International Conference on ASIC (ASICON).
[52] Jie Wei, Xiaorong Luo*(通信作者),Yanhui Zhang, et al. Accumulation-Mode High Voltage SOI LDMOS with Ultralow Specific On-resistance, IEEE ISPSD, Hongkong, China, 9-14, May, 2015.
[53] Xiaorong Luo, Y G Wang, M Qiao, Bo Zhang, Zhaoji Li, et al. Novel High Voltage LDMOS on Partial SOI with double-sided Charge Trenches, IEEE ISPSD, San Diego,California, USA , 23-26 May, 2011.
[54] Xiaorong Luo, Tianfei Lei, Wang Yuangang, et al. A Novel High Voltage (>700V) SOILDMOS with Buried N-layer in a Self-isolation High Voltage Integrated Circuit, IEEE ISPSD, Hiroshima, Japan, June 6, 2010.
[55]Kun Zhou, Xiaorong Luo*(通信作者), Qing Xu, et al. Ultralow Specific On-Resistance High Voltage LDMOS with a Varible-K Dielectric Trench, IEEE ISPSD,Waikoloai, USA, Jun.2014.
[56] Jie Wei, Xiaorong Luo*(通信作者), Xianlong Shi, et al. An Improved On-resistance High Voltage LDMOS with Junction Field Plate, IEEE ISPSD, Waikoloai,USA, Jun. 2014.
[57] Xiaorong Luo*,Kun Zhou,Zhaoji Li,Bo Zhang ,Ultralow specific on-resistancetrench lateral power MOSFETS ,2014 IEEE International Conference on Solid-State and Integrated Circuit Technology,1784-1787,2014.10.28-2014.10.31。
专利、著作版权等
授权 4 项美国专利
[1] Xiaorong Luo, Florin Udrea, SOI Lateral MOSFET Devices, 2013 . 授权
[2] Xiaorong Luo, Guoliang Yao, Tianfei Lei, et al. Trench-type semiconductor power
devices, 2012. 授权
[3] Xiaorong Luo, J Y Xiong, Chao Yang, et al. Enhancement mode high ࣺᯬ
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