Dong-Xue Li, Liang Chien, Xinnian Wei, Xin-Ping Qu, Tzu-Hsuan Chang, Shisheng Xiong*. "Sub-10nm Silicon FinFET Devices on SOI Substrate Made by Block Copolymer Lithography". IEEE ICSICT conference (2018)
Shisheng Xiong*, Dongxue Li, Su-Mi Hur, Gordon S.W. Craig, Christopher G. Arges, Xin-Ping Qu, and Paul F. Nealey. "The Solvent Distribution Effect on the Self-assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing." Macromolecules (2018) 51 (18), 7145-7151
Zhang, Qi, Fumiaki Matsuoka, Hyo Seon Suh, Peter A. Beaucage, Shisheng Xiong, Detlef-M. Smilgies, Kwan Wee Tan, J G. Werner, Paul F. Nealey, and Ulrich B. Wiesner. "Pathways to Mesoporous Resin/Carbon Thin Films with Alternating Gyroid Morphology." ACS nano (2017).12 (1), pp 347-358
Suh, Hyo Seon, Priya Moni, Shisheng Xiong, Leonidas E. Ocola, Nestor J. Zaluzec, Karen K. Gleason, and Paul F. Nealey. "Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat." Nature nanotechnology 12, no. 6 (2017): 575.
Yang, Guan-Wen, Guang-Peng Wu, Xuanxuan Chen, Shisheng Xiong, Christopher G. Arges, Shengxiang Ji, Paul F. Nealey, Xiao-Bing Lu, Donald J. Darensbourg, and Zhi-Kang Xu. "Directed Self-Assembly of Polystyrene-b-poly (propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography." Nano Letters 17, no. 2 (2017).
Segal-Peretz, T., J. Ren, S. Xiong, G. Khaira, A. Bowen, L. E. Ocola, R. Divan et al. "Quantitative Three-Dimensional Characterization of Block Copolymer Directed Self-Assembly on Combined Chemical and Topographical Prepatterned Templates." ACS nano 11, no. 2 (2017): 1307.
Chang, Tzu-Hsuan, Shisheng Xiong, Robert M. Jacobberger, Solomon Mikael, Hyo Seon Suh, Chi-Chun Liu, Dalong Geng et al. "Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns." Scientific reports 6 (2016): 31407.
Xiong, Shisheng, Yves-Andre Chapuis, Lei Wan, He Gao, Xiao Li, Ricardo Ruiz, and Paul F. Nealey. "Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing." Nanotechnology 27, no. 41 (2016): 415601.
Xiong, Shisheng, Lei Wan, Yoshihito Ishida, Yves-Andre Chapuis, Gordon SW Craig, Ricardo Ruiz, and Paul F. Nealey. "Directed self-assembly of triblock copolymer on chemical patterns for sub-10-nm nanofabrication via solvent annealing." ACS nano 10, no. 8 (2016): 7855-7865.
Gurdaman S. Khaira, Jian Qin, Grant P. Garner, Shisheng Xiong, Lei Wan,Ricardo Ruiz, Heinrich M. Jaeger, Paul F. Nealey, and Juan J. de Pablo. "Evolutionary Optimization of Directed Self-Assembly of Triblock Copolymers on Chemically Patterned Substrates." ACS Macro Lett., no. 3 (2014): 747-752
Huang, Yinggang, Tae Wan Kim, Shisheng Xiong, Luke J. Mawst, Thomas F. Kuech, Paul F. Nealey, Yushuai Dai et al. "InAs Nanowires Grown by Metal-Organic Vapor-Phase Epitaxy (MOVPE) Employing PS/PMMA Diblock Copolymer Nanopatterning." Nano letters 13, no. 12 (2013): 5979-5984.
Xiong, Shisheng, Darren R. Dunphy, Dan C. Wilkinson, Zhang Jiang, Joseph Strzalka, Jin Wang, Yongrui Su, Juan J. de Pablo, and C. Jeffrey Brinker. "Revealing the interfacial self-assembly pathway of large-scale, highly-ordered, nanoparticle/polymer monolayer arrays at an air/water interface." Nano letters 13, no. 3 (2013): 1041-1046.
