2002.3 2006.1 大连理工大学 材料科学与工程 博士 1999.9 2002.3 东北大学 材料学 硕士 1991.9 1995.7 东北大学 金属材料及热处理 学士

2006.1 至今 大连理工大学 1995.7 1999.9 抚顺市抚顺特殊钢有限公司技术中心 技术员

主持或参加科研项目（课题）及人才计划项目情况（按时间倒序排序）： 国家重点研发计划新能源汽车重点专项，2016YFB0101318，高稳定性高品质金属双极板表面改性量产工艺开发，2016/07-2021/06，在研，参加 中央高校基本科研业务费专项，DUT16ZD207，燃料电池金属双极板改性层材料及其制备技术，2016/01-2017/12，已结题，主持 中央高校基本科研业务费专项，DUT11LK44，基于微晶硅/纳米Ag多层薄膜中表面等离子体陷光特性研究，2011/01-2012/12，已结ᠦ୔

近年来发表的研究论文 X.Y.Yi, C.Y.Ma*, ,F.Yuan,N.Wang,F.W.Qin, B.C.Hu, Q.Y.Zhang, Structural, morphological,photoluminescence and photocatalytic properties of Gd-doped ZnO films, Thin Solid Films，2017，636：339 ~345 X.Q.cheng, C.Y.Ma*, X.Y.Yi, F.Yuan, Y.Xie, J.M.Hu, B.C.Hu, Q.Y.Zhang, Structural, morphological, optical and photocatalytic properties of Gd-doped TiO2 films, Thin Solid Films，2016，615：13 ~ 18 D.Q.Shi, W.Xu, C.Y.Miao, C.Y.Ma, C.S.Ren, W.Q.Lu, Q.Y.Zhang*, A high-activity nitrogen plasma flow source for deposition of silicon nitride films, Surface and Coatings Technology，2016，294：194~200 D.Q.Shi, B.C.Hu, W.Xu, X.N.Li, C.Y.Ma, Q.Y.Zhang*, Bright luminescence in amorphous hydrogenated silicon-nitride quantum-dot films prepared by a special designed PECVD system, Journal of Luminescence, 2016, 175: 67~70 Q.Y.Zhang*, J.Shaibo, J.Ju, M.Liu, S.Cheng, Y.J.Ma, J.Y.Xiao, X.N.Jiang, C.Y.Ma, Rehabilitation of MgO(001) substrate surface for growth of single cryatal LaBaCo2O5+δ films by magnetron sputtering, Crystal Growth and Design, 2016,16,4272~4277 D.Q.Shi, W.Xu, C.Y.Miao, C.Y.Ma, C.S.Ren, W.Q.Lu, Q.Y.Zhang*, A high-activity nitrogen plasma flow source for deposition of silicon nitride films, Surface and Coatings Technology，2016，294：194~200 D.Q.Shi, B.C.Hu, W.Xu, X.N.Li, C.Y.Ma, Q.Y.Zhang*, Bright luminescence in amorphous hydrogenated silicon-nitride quantum-dot films prepared by a special designed PECVD system, Journal of Luminescence, 2016, 175: 67~70 Q.Y.Zhang*, J.Shaibo, J.Ju, M.Liu, S.Cheng, Y.J.Ma, J.Y.Xiao, X.N.Jiang, C.Y.Ma, Rehabilitation of MgO(001) substrate surface for growth of single cryatal LaBaCo2O5+δ films by magnetron sputtering, Crystal Growth and Design, 2016,16,4272~4277 Chunyu Miao, Dequan Shi, Chunyu Ma, Chunsheng Ren, Wenqi Lu, Qingyu Zhangn, Chao Zhang, Zhong Yi, Mode transition and related discharge phenomena of a tube plasma source oprating in low pressure pure nitrogen atmosphere, IEEE TRANSACTIONS PLASMA SCIENCE, 2015, 43(2):544~551 Qiang Tao, Shuai Li, Chunyu Ma, Hun Liu, Qingyu Zhang*, A highly sensitive and recyclable SERS substrate based on Ag-nanoparticle-decorated ZnO nanoflowers in ordered arrays, Dalton Transactions, 2015, 44:3447~3453 H.H.Zhang, C.Y.Ma*, Q.Y.Zhang, Scaling behavior and structure transition of ZrO2 films deposited by RF magnetron sputtering, Vacuum, 2009, 83:1311~ 1316 C.Y.Ma*, W.J.Wang, S.L.Li, C.Y.Miao, Q.Y.Zhamg, Multifractal, structural, and optuical properties of Mn-doped ZnO films, Applied Surface Science, 2012, 261:231~ 236 C.Y.Ma*, Q.Y.Zhang, Interfacial layer growth of ZrO2 films on silicon, Vacuum, 2008, 82:847~ 851 C.Y.Ma, P.Briois*, J.BÖhlmark, F.Lapostolle, A.Billard, La9.33Si6O26 electrolyte thin films for IT-SOFC application deposited by a HIPIMS/DC hybrid magnetron sputtering process, Ionics, 2008,14:471~ 476 C.Y.Ma*, F.Lapostolle, P.Briois, Q.Y.Zhang, Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films, Applied Surface Science, 2007, 253:8718~ 8724